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Re: forztnt2 post# 110949

Wednesday, 08/03/2022 3:09:46 PM

Wednesday, August 03, 2022 3:09:46 PM

Post# of 197717
Great news on the ALD patent. This is future proofing LWLG technology. I spoke with my buddy who works for a large semiconductor materials supplier about the importance of ALD. He described Atomic Layer Deposition as the next step in advancement for Chemical Vapor Deposition. Both are commonly used and standard practice in advanced semiconductor foundries.

However, ALD is capable of creating a layer that is only a few atoms in thickness. This allows for the layer to be perfectly smooth, which is really important when building devices that transmit light, since you do not want any rigid surface that can refract or interrupt the light causing loss or degradation.

This patent appears to be very important in producing devices in an advanced foundry with inline wafer test (pre-packaging) AT SCALE. As of now, one of the most time consuming parts of producing photonics in a foundry setting is wafer testing. Reducing this friction could be the enabling factor acceptance into a foundry.

I would be interested to find out exactly which foundries have the equipment and expertise for Atomic Layer Deposition. That would be a good indication of our near term foundry partners. I will post it here if I find this information.
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