Coretec Group Inc (CRTG)

[Quikshft]

quikshft - Here are the claims from the patent. How dependent on cyclohexasilane is this?

Chat - Based on the claims in the patent, it appears that the invention is dependent on the use of cyclohexasilane (CHS) as a precursor material for the deposition of silicon-containing films. Specifically, claims 1 and 14 both require the use of CHS as a precursor for depositing a silicon-containing film on a substrate. Additionally, claim 2 specifies that the CHS is used as a source of silicon atoms, and claim 7 specifies that the silicon-containing film is a silicon carbide film, which is formed from CHS and a carbon-containing precursor.

While other precursors may also be used for depositing silicon-containing films, the claims in this patent specifically rely on the use of CHS as the precursor material. Therefore, the methodology described in this patent would likely not be possible without the use of CHS.