Intel Corp (INTC)

[jokerman]

Kaizad Mistry 22nm presentation from SEMICON West

"self-aligned" is key.
- self-aligned double patterning for 60nm fin pitch
- self-aligned contacts
- self-aligned vias

In addition
- slide 29: defect density curve vs 32nm
- slide 17: tight RO delay distribution
- slide 33: fin width scaling is key for 14nm and beyond

http://www.semiconwest.org/sites/semiconwest.org/files/docs/Kaizad%20Mistry_Intel.pdf