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Re: Elmer Phud post# 8970

Friday, 02/13/2004 12:17:00 AM

Friday, February 13, 2004 12:17:00 AM

Post# of 151812
Elmer, Re: SI's preliminary analysis has confirmed the presence of seven levels of copper metalization and revealed several industry firsts, including an advanced nickel - silicide process on the transistor gates, a strained silicon SiGe layer to improve channel mobility, and uniquely customized PMOS and NMOS devices. The process also confirms Intel's stated position that SOI is unnecessary to achieve high performance.

And in spite of all this - not to mention the much deeper pipeline - Prescott still fails to reach the same clock frequency as Northwood. I still think the engineers should hang their heads in shame.

Of course, things are bound to get better, but when?
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