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wbmw

01/27/07 1:13 PM

#37897 RE: Maui #37872

Re: Nishi described IBM's advance as still in the research phase. IBM made its announcement as part of its research partnership with Intel's rival, Advanced Micro Devices of Sunnyvale, along with Sony and Toshiba.

The two companies have different approaches to their use of high-k metal gates.

Doherty, the Envisioneering analyst, said IBM integrates their high-k metal inside the silicon, where Intel's development is on top of the silicon.

``Imagine a farm where the irrigation is on the surface, moving across the land,'' Doherty said. ``The Intel technique is making sure there is good metal irrigation on the surface and IBM has gone straight into the ground with sprinklers.'' He said IBM's approach could enable it to stack more layers together in the silicon, and thus enable even more transistors.


I thought it was worth highlighting the differences. Let's see if IBM's "research" project makes it to market on schedule.
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chipguy

01/27/07 1:38 PM

#37906 RE: Maui #37872

Doherty, the Envisioneering analyst, said IBM integrates their high-k metal inside the silicon, where Intel's development is on top of the silicon.

``Imagine a farm where the irrigation is on the surface, moving across the land,' Doherty said. ``The Intel technique is making sure there is good metal irrigation on the surface and IBM has gone straight into the ground with sprinklers.' He said IBM's approach could enable it to stack more layers together in the silicon, and thus enable even more transistors.


ROFL. In other words Intel's process is not a real native
high k 45 nm process.

Apparently the cross cultural exchangee between AMD
and IBM chip folk isn't just one way.