Intel Corp (INTC)

[Yousef]

Elmer,

Re: "As you know, I'm not a process guy but I assume it's like running continuous skew
runs. Is it the litho guys who bear the brunt of it?"

The best "knob" to turn is poly linewidth ... Thus it is both a litho and
etch issue. Both of these need to be closely monitored. I have seen the
poly etch bias be as hard to control as the litho bias. I have also seen
etch bias from isolated to dense features and PFET versus NFET biases at etch.
At least in Litho, some of these can be corrected on the reticle. Pushing
the process just reduces the margin for devices to be out of spec (Ioff, BVdss, Vt, ...).

Make It So,
Yousef