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Re: Tenchu post# 81668

Wednesday, 06/17/2009 9:11:25 AM

Wednesday, June 17, 2009 9:11:25 AM

Post# of 151709
The technology gears at Intel keep on turning.

Expanding Long-Term Memory for Chips
June 16, 2009

While performance-improving cache memory gets a lot of attention, there is an increasing need on today's chips for programmable read-only memory (PROM) as well. This is used to permanently store information for such user-visible features as code storage and on-chip encryption keys, as well as yield-enhancing functions such as cache repair and post-silicon circuit tuning. PROMs rely on electrical fuses for in-factory programming. Salicided polysilicon has traditionally served as a fuse element in several generations of CMOS technologies, but Intel's recent transition to high-k metal-gate technology requires a significant shift in fuse design to metal fuses.

Intel has developed a new metal fuse-based 3-D high-density PROM technology that is fully compatible with high-k metal gate. The new technology has been developed for Intel's 32nm process, on which it has a 1.37 square micron cell. It is readily scalable for future logic technologies. Details are being described this week at the 2009 Symposia on VLSI Technology and Circuits in Kyoto, Japan.


http://www.intel.com/pressroom/innovation/innovation.htm#061609a
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