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FSI International (FSII) RSS Feed

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http://www.waferfabs.org/images/logos/associate_members/fsi_logo.gif

FSI INTERNATIONAL INC. COMPANY PROFILE

Headquartered in Chaska, Minnesota, USA, FSI is a global supplier of surface conditioning equipment and technology to the world’s leading integrated circuit (IC) and microelectronics manufacturers.

FSI offers a complete portfolio of proven cleaning technologies to address the unique requirements of its customers, including batch and single wafer platforms for immersion, spray and cryokinetic products.

Founded in 1973 on the premise that collaborating closely with customers enables IC manufacturers to meet their business goals better and faster, FSI supports this philosophy of collaborative innovation with a comprehensive approach to technology advancement, differentiated products, a global infrastructure, and strong local support to help IC manufacturers drive down their overall cost of manufacturing and migrate to the next technology generation.

FSI has always recognized the importance of advanced product and applications development, establishing one of the industry’s first equipment supplier-based laboratories more than 25 years ago. Today, FSI works for and with its customers — in FSI’s Class 1 demonstration and development laboratory and in IC manufacturing facilities worldwide — to develop, demonstrate and integrate solutions to meet their specific needs.

FSI’s global network of offices is staffed by highly trained, responsive, dedicated teams, all backed by the experience and expertise of the Chaska, Minnesota, USA headquarters.

WEBSITE

http://www.fsi-intl.com/

 


Applications and Products

Applications & Products

FSI is focused on delivering semiconductor wafer cleaning products and processes that enable IC manufacturers to meet their cost, yield and device performance goals. Whether in FSI’s demonstration and development lab or IC manufacturing facilities, FSI works for and with customers to develop, demonstrate and integrate solutions to meet their specific needs.

FSI has been a leading provider of cleaning technologies for more than 35 years. Today, FSI offers a complete range of proven single wafer and batch platforms for immersion, spray, vapor and cryokinetic cleaning applications.

Request More Information



News and Events

 FSI International, Inc. Announces Revised Third Quarter Financial Performance Guidance

MINNEAPOLIS (May 26, 2010) -- FSI International, Inc. (Nasdaq: FSII), a manufacturer of capital equipment for the microelectronics industry, today announced revised financial performance guidance for the third quarter ending May 29, 2010.

Revised Third Quarter Guidance

Given the quarter-to-date orders, the company now expects third quarter orders to be between $28.0 and $30.0 million, as compared to $22.8 million in the second quarter of fiscal 2010.* Based on quarter-to-date shipments, the company now expects third quarter fiscal 2010 revenues of $27.0 to $29.0 million as compared to $18.9 million in the second quarter of fiscal 2010.* Assuming that the company can achieve anticipated gross profit margin and the operating expense levels, the company expects net income of $5.0 to $6.0 million for the third quarter of fiscal 2010, as compared to $609,000 in the second quarter of fiscal 2010.*

On March 30, 2010, the company had provided third quarter order, revenue and net income guidance of $25 to $27 million, $23 to $25 million and $2.5 to $3.0 million, respectively. The company expects to report actual third quarters financial results on June 24, 2010.

About FSI

FSI International, Inc. is a global supplier of surface conditioning equipment, technology and support services for microelectronics manufacturing. Using the company’s broad portfolio of cleaning products, which include batch and single-wafer platforms for immersion, spray, vapor and cryokinetic technologies, customers are able to achieve their process performance flexibility and productivity goals. The company’s support services programs provide product and process enhancements to extend the life of installed FSI equipment, enabling worldwide customers to realize a higher return on their capital investment. For more information, visit FSI’s website at
http://www.fsi-intl.com, or call Benno Sand, 952.448.8936.

“Safe Harbor” Statement Under the Private Securities Litigation Reform Act of 199552 week high on record volume


 

FSI Receives ORION® Single Wafer Cleaning System Order from Leading Global Semiconductor Foundry for 32/28nm FEOL Applications

Date : 06/24/2010 @ 4:05PM
Source : Business Wire
Stock : FSI International, Inc. (FSII)
Quote : 4.58  -0.07 (-1.51%) @ 7:22AM
 

FSI Receives ORION® Single Wafer Cleaning System Order from Leading Global Semiconductor Foundry for 32/28nm FEOL Applications

Fsi International (MM) (NASDAQ:FSII)
Intraday Stock Chart

Today : Thursday 24 June 2010

Click Here for more Fsi International (MM) Charts.

FSI International, Inc. (Nasdaq: FSII), a leading supplier of surface conditioning equipment for microelectronics manufacturing, announced today that it has received an order for its ORION single wafer processing system from a second major semiconductor foundry based in Asia. The ORION system, scheduled to ship later this summer, was selected primarily for its superior performance in nickel platinum (NiPt) silicide processing and all-wet photoresist stripping in 32/28nm front-end-of-line (FEOL) applications.

“This order is evidence of the performance advantages offered by the ORION system in advanced processing applications,” said John Ely, Vice President of Global Sales, Marketing and Service at FSI. “The selection was made after a rigorous competitive evaluation. FSI successfully demonstrated the ORION system’s unique ability to completely remove unreacted NiPt (10%) and to provide all-wet photoresist stripping using the high temperature ViPRTM process. This order also represents the continued success and acceptance of FSI’s leading advanced single wafer cleaning technology by the world’s leading foundries,” continued Ely.

Unique among single wafer processing tools, the ORION system’s closed chamber design effectively contains process chemicals, permitting the use of the aggressive, high temperature sulfuric peroxide mixture (SPM) chemistry of the ViPR process. Standard SPM chemistries are unable to completely remove unreacted platinum (Pt). Hydrochloric acid (HCl) based chemistries can remove the metal, but cause parasitic oxidation of the silicide. The ViPR process effectively removes unreacted Pt without causing parasitic oxidation, thus improving the quality, repeatability and speed of metal stripping in advanced NiPt salicide processes and extending the use of these processes to future CMOS generations. At the same time, the high reactivity of the ViPR process enables the ORION system to strip implanted photoresist by wet chemical action alone (for all but the most extreme implant conditions), eliminating the need for ashing and reducing the stripping sequence to a fast, single step.

About FSI International

FSI International, Inc. is a global supplier of surface conditioning equipment, technology and support services for microelectronics manufacturing. Using the company’s broad portfolio of cleaning products, which include batch and single-wafer platforms for immersion, spray, vapor and cryogenic aerosol technologies, customers are able to achieve their process performance, flexibility and productivity goals. The company’s support services programs provide product and process enhancements to extend the life of installed FSI equipment, enabling worldwide customers to realize a higher return on their capital investment. For more information, visit FSI’s website at http://www.fsi-intl.com.

 

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