InvestorsHub Logo
Followers 0
Posts 60
Boards Moderated 0
Alias Born 01/15/2016

Re: None

Friday, 10/28/2016 5:25:18 AM

Friday, October 28, 2016 5:25:18 AM

Post# of 7602
Paper just published online about Andrew Barron's research on the surface initiated growth of copper on aluminum using Natcore's back contact aluminum silicon wafers. Here's a quote:

"Materials and methods

Isonicotinic acid (iNA), copper(II) sulfate pentahydrate
(CuSO4.5H2O), hydrazine hydrate (N2H4.H2O),
ethylenediaminetetraacetic acid (EDTA), formaldehyde
solution (37 wt%), tin(II) chloride (SnCl2), and
palladium(II) chloride (PdCl2) were purchased from
Sigma-Aldrich, Ltd. and used as received. Aluminacoated
silicon wafers prepared by atomic layer deposition
(ALD) were provided by Natcore Technology,
Inc. (NTX.V)."

Here's the link:

http://paperity.org/p/78294606/surface-initiated-growth-of-copper-using-isonicotinic-acid-functionalized-aluminum-oxide